Molds for NIL, Thermal Embossing, & Photolithography
We offer a variety of nanopatterned and micropatterned molds for roll-to-roll and plate-to-plate UV nanoimprint lithography (UV NIL), thermal embossing, extrusion, and photolithography. Contact us if you would like more information or to discuss custom development.
Mold Specs
Materials: High-phosphorous nickel, copper, and aluminum. Seamless cylindrical photomasks are metal-coated glass or quartz.
Dimensions: Up to 6.5 inches in diameter and 6.5 inches long. Larger dimensions possible with equipment upgrade.
Form Factors: Flexible shims, seamless cylindrical drums, seamless cylindrical sleeves, and seamless cylindrical photomasks.
Feature Specs
Pitch: 200 nm to 8 microns demonstrated. Larger and smaller pitches possible with development.
Aspect Ratio: Up to about 0.7 (height:pitch).
Lattices: Square, hexagonal, and stochastic.
Shapes: Bumps, pillars, microlenses, pyramids, hierarchical features (nanofeatures on top of microfeatures), and more. SEM images of diamond dies and polymer replicas of our molds are shown below (molds will have inverted gender from SEM images).
Custom Development
Contact us to discuss custom development of master molds in the form of shims, seamless sleeves, and seamless cylinders for plate-to-plate and roll-to-roll nanoimprint lithography (R2R NIL), thermal embossing, and extrusion processes.